Search results for "Photoelectrochemical characterization"

Photoelectrochemical Characterization of Oxide Layers on 316L Stainless Steel Grown in High temperature Water

2014

Photoelectrochemical evidence of Nitrogen Incorporation during Anodizing of valve metals alloys

2015

Amorphous and/or nanocrystalline oxide films can be easily prepared electrochemically by anodizing. The anodizing allows to grow oxides with structural and compositional features easily and strictly controlled by the process parameters.

The effect of Annealing Conditions on the Impedance and on the Photoelectrochemical behavior of TiO2 Nanotubes

2015

Titanium oxide nanotubes (NTs) have attracted much attention during last decade due to their special characteristics such as one-dimensional highly ordered geometry with large surface area and good chemical and optical stability.

Photoelectrochemical characterization of amorphous anodic films on Ti-6at.%Si

2013

Abstract The solid state properties of anodic films grown galvanostatically on sputtering-deposited Ti–6at.%Si alloys were studied as a function of the formation voltage (5–40 V). From the photocurrent spectra a band gap of ∼3.4 eV was estimated for all the investigated thicknesses, which is almost coincident with the value measured for amorphous TiO 2 . The photocharacteristics allowed to estimate the flat band potential of the films, which resulted to be more anodic for thicker layers and allowed to evidence a change from n-type semiconducting material to insulator by increasing the formation voltage. A dielectric constant of ∼31 was estimated by differential capacitance measurements. The…

Polymeric C3N4 and O-doped C3N4: Photoelectrochemical and EPR Features for Selective Photocatalytic Oxidation of Alcohols to Aldehydes

2018

Polymeric C3N4 and O-doped C3N4: Photoelectrochemical and EPR Features for Selective Photocatalytic Oxidation of Alcohols to Aldehydes

Anodic Electro Deposition of CeO2 and Co-Doped CeO2 Thin Films

2013

CeO2 and Co containing CeO2 thin films were deposited on indium tin oxide and stainless steel by anodic electrodeposition. Scanning electron microscopy showed that the films are flat and show globular morphology and cracks resulting from volume shrinking. According to XRD and Raman Spectroscopy pure ceria layers are crystalline, while the presence of Co induces the formation of amorphous films. The good adhesion and the compactness allowed the photoelectrochemical characterization of the films. A band gap value of 2.9 eV was estimated for CeO2, while slightly higher values (̃3.0 eV) were estimated for Co containing films. A mechanism for ceria anodic electrodeposition is proposed and discus…

Growth and Characterization of Anodic Films on Scandium

2013

The anodic behavior of Sc in a slightly alkaline aqueous solution is studied. Electrochemical and capacitance measurements suggest that passive films can be formed on the scandium surface under a high electric field. The formation of these layers occurs at low faradaic efficiency due to oxygen evolution. Photoelectrochemical experiments suggest the formation of a barrier layer with a thickness high enough to hinder external electron photoemission processes and allow the estimation of the bandgap of the films as a function of their formation voltage. The estimated bandgap values were lower than that reported for Sc2O3, suggesting the formation of hydrated phases and/or of a strongly oxygen d…

Photoelectrochemical evidence of inhomogeneous composition at nm length scale of anodic films on valve metals alloys

2015

Anodic films of different thickness (∼30 nm and 70 nm) were grown by anodizing sputtering-deposited Ta-19at% Al to different formation voltages. N incorporation into the anodic films was inducing by performing the anodizing process in ammonium containing solutions. Layered anodic films were prepared by a double formation procedure with a first anodizing step in ammonium biborate solution and second anodizing step in borate buffer solution, or vice versa. Glow Discharge Optical Emission Spectroscopy was employed to show the distribution of N across the oxide. Photoelectrochemical measurements evidenced a red shift of the light absorption threshold due to N incorporation. A model was proposed…

Photoelectrochemical evidence of Nitrogen Incorporation during Anodizing of Sputtering-Deposited Al-Ta alloys

2016

Anodic films were grown to 20 V on sputtering-deposited Al–Ta alloys in ammonium biborate and borate buffer solutions. According to glow discharge optical emission spectroscopy, anodizing in ammonium containing solution leads to the formation of N containing anodic layers. Impedance measurements did not evidence significant differences between the dielectric properties of the anodic films as a function of the anodizing electrolyte. Photoelectrochemical investigation allowed evidencing that N incorporation induces a red-shift in the light absorption threshold of the films due to the formation of allowed localized states inside their mobility gap. The estimated Fowler threshold for the intern…

The effect of hydration layers on the anodic growth and on the dielectric properties of Al2O3 for electrolytic capacitors

2014

Hydrous films were grown on high purity and cubicity Al foils for electrolytic capacitors in deionized water, ethylene glycol - deionized water and in glycerol - deionized water for different immersion times. According to the X-ray diffraction patterns the hydration treatment allowed to grow a pseudo boehmite layer on Al surface whose morphology is appreciably affected by the bath composition. Capacitance measurements and photoelectrochemical findings suggest that a more compact barrier layer forms during the immersion in alcohol containing solutions. The hydration in water allowed to save energy and to prepare more blocking oxide films. The beneficial effect of hydration in hot water on th…